New high-clarity antiblock for tacky polyethylene film resins
Canadian Plastics
Equistar Chemicals' new antiblock additive concentrate, Spectatrech CM12392, is the first inorganic antiblock available for use with tacky polyethylene film resins, including metallocenes, metallocene...
Equistar Chemicals’ new antiblock additive concentrate, Spectatrech CM12392, is the first inorganic antiblock available for use with tacky polyethylene film resins, including metallocenes, metallocene blends and high ethylene vinyl acetates. CM12392 provides excellent resistance to blocking and can help converters achieve high production rates in industrial packaging. The antiblock also does not degrade the inherent clarity properties of the base polyolefin film resin. CM12392 is a 20 percent concentration of inorganic, silicon-dioxide antiblock in a low-density polyethylene, high-clarity carrier resin. It is formulated for use at extrusion temperatures of 300 to 600F.
Equistar Chemicals, LP 713/309-4970
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